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| Solarfabrik 2020 > Projects > Plasma-based coating and etching processes |
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Development and optimization of plasma-based coating and etching processes to increase the efficiency of crystalline silicon solar cells
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The global market for photovoltaic (PV) technology is growing at an average annual rate of 30 to 40%. To sustainably reverse global climate change, it is vital that this growth not only continues but also further increases. A precondition for this is a significant reduction in the cost of manufacturing PV modules. A highly promising approach for lowering costs is the integrated production of solar cells, in order to reduce the complex handling between processing steps to a minimum. In addition, the use of PVD technologies means that coating costs of at maximum a few euros per square meter can be expected. In-line technologies for depositing metallic contacts and transparent electrodes are currently available and have been introduced in industry. One goal of the project is to investigate the suitability of these technologies for producing solar cells and in particular for lowering costs, and where relevant to optimize these processes. Further goals of the project are to evaluate magnetron-based PECVD processes as potential technologies for favorable-cost, high-area deposition of silicon-absorber layers.
An excellent tool for processing work pieces in a vacuum is an electron beam. For this reason the suitability of an electron beam for drilling thin silicon wafers and the cost-saving potential of this will be investigated.
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